Members from the ALD Lab Saxony have been chairing and attending this year’s ALD conference in Dublin Ireland. 18 contributions (posters and talks) have been presented by our members which you can find in the attached list. To have a closer look on the presented topics you can open the linked abstracts by clicking on the titles.
Photos taken at the conference can be viewed at ALD 2016 Ireland photo galery at www.katharinaknaut.com.
Delegates of the ALD Lab Saxony at ALD 2016 Conference in Dublin, Ireland. From left to right: C. Georgi, A. Zienert, L. Jäckel, U. Helmstedt, M. Junige, D. Fischer, C. Militzer, U. Schröder, W. Gödel, C. Hoßbach, M. Knaut and J. W. Bartha, already departed: J. Sundqvist, H.-D. Schnabel and S. Wege – photo by Katharina Knaut
- Fischer, D. Dustin
Institude of Semiconductor and Microsystems, Technische Universität Dresden, Germany
Comparison of MLD-processes with aromatic and linear organic precursor investigated by in situ QCM and in vacuo XPS
Monday 25 July: Joint poster session 1 – 17:15-19:00
- Georgi, Colin
Fraunhofer Institute for Electronic Nano Systems, Germany
Thermal ALD of metallic copper on cobalt for advanced interconnects
Monday 25 July: Joint poster session 1 – 17:15-19:00
- Goedel, Werner A.
Technische Universität Chemnitz, Physical Chemistry, Germany
Molecular Layer Deposition of Titania/Furfuryl alcohol hybrid material and subsequent pyrolysis to Titania/Carbon hybrid material
Tuesday 26 July: Hybrid organic-inorganic films – 12:00-12:15
- Helmstedt, Ulrike
Leibniz Institute of Yurface Modification, Germany
Thermal Low-Temperature Deposition of Platinum Nanoparticles on Carbon Nanotubes
Monday 25 July: Joint poster session 1 – 17:15-19:00
- Hossbach, Christoph
TU Dresden, Institute of Semiconductors and Microsystems, Germany
Organic electronic devices with inorganic high-k gate oxides grown by Atomic Layer Deposition
Tuesday 26 July: High-k dielectrics 1 – 09:15-09:30
- Hu, Xiao
Chemnitz University of Technology, Germany
Large-scale reactive dynamics simulations of Cu ALD using a newly developed ReaxFF potential
Wednesday 27 JULY: Metals and elements – 12:15-12:30
- Jäckel, Linda
Fraunhofer Institute for Electronic Nano Systems, Germany
Modeling of precursor properties and first steps towards fluid dynamics simulations for TaN ALD
Monday 25 July: Joint poster session 1 – 17:15-19:00
- Junige, Marcel
Technische Universität Dresden, Germany
The ALD of Ru and RuO2 – An intertwined special case
Wednesday 27 JULY: Noble metals – 09:15-09:30
- Knaut, Martin
Technische Universtität Dresden, Institute of Semiconductors and Microsystems, Germany
Atomic layer deposition and 3D nanoscale substrates – nanowires, nanotubes and nanopores
Wednesday 27 JULY: High aspect ratio nanostructures – 16:00-16:15
- Kühnel, Kati
Fraunhofer IPMS CNT, Germany
Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Tuesday 26 July: Applications in ULSI nanoelectronics – 09:00-09:15
- Melzer, Marcel
Technische Universität Chemnitz, Germany
Atomic layer deposition of ultrathin closed copper films with a thickness below 3 nm
Tuesday 26 July: Poster session 2 – 17:15-19:00
- Militzer, Christian
Technische Universität Chemnitz, Physical Chemistry, Germany
Atomic Layer Deposition of Titanium Phosphate onto Carbon Fiber Bundles
Wednesday 27 JULY: High aspect ratio nanostructures – 16:30-16:45
- Schnabel, Hans-Dieter
Westsächsische Hochschule, Germany
Comparison of low temperature PEALD-TiO2-films oxidizing with Water or Oxygen
Monday 25 July: Joint poster session 1 – 17:15-19:00
- Schroeder, Uwe
University of Applied Sciences, Germany
Impact of ALD processing on non-volatile memory performance of ferroelectric HfO2 based capacitors
Tuesday 26 July: Memory applications 2 – 14:30-14:45
- Schuster, Jörg
Fraunhofer Institute for Electronic Nano Systems (ENAS), Germany
Reactor scale simulation of atomic layer deposition
Monday 25 July: Joint poster session 1 – 17:15-19:00
- Shukla, Shashank
TU Dresden, Institute of Semiconductors and Microsystems, Germany
Atomic Layer Deposition system for fast Precursor Screening
Monday 25 July: Joint poster session 1 – 17:15-19:00
- Wege, Stephan
plasway-Technologies GmbH, Germany
Plasma Processing Reactor Design
Sunday 24 July: Tutorial: Plasma processing – 14:45-15:15
- Weinreich, Wenke
Fraunhofer IPMS-CNT, Germany
ALD La-doped ZrO2 for BEoL compatible decoupling capacitors
Tuesday 26 July: Poster session 2 – 17:15-19:00