The ALD Lab Saxony just held its annual Symposium at SEMICON Europe in Munich, Germany. Prof. Bartha, Dr. Jonas Sundqvist, Dr. Martin Knaut and Dr. Christoph Hossbach have been organizing the event since 2012 in Dresden. This year about 50 persons attended the symposium.
The Intention of the Symposium is to improve visibility of the Atomic Layer Deposition technique and its capabilities and to increase the networking within the ALD community. The given talks gave an overview of current research and development topics as well as examples of ALD applications, equipment, chemical and supply chain in manufacturing. This year’s agenda combined several talks from ALD Lab Saxony members and partners from academia and industry on ALD equipment, applications, metrology as well as ALD simulations. This year the symposium was divided into two sessions: “Equipment and Applications” and “Precursors, Precursor Delivery, Metrology and Simulations”
New exciting applications in the field of MEMS were presented by Fraunhofer ISIT, ALD corrosion protection by Bosch and metal precursor sourcing and supply chain solutions by Umicore to mention a few. The complete Agenda can be found here (LINK: http://www.semiconeuropa.org/ald-lab-symposium-2017) and upon request the presentations will become available.
“Welcome”, Prof. Bartha, TU Dresden (Germany)
“ALD for Production”, Dr. Christoph Hossbach, Picosun (Finland/Germany)
“ALD equipment and precursors for high volume manufacturing”, Dr. Jonas Sundqvist, Fraunhofer IKTS (Germany)
“ALD process monitoring with quartz crystal microbalances”, Dr. Martin Knaut, TU Dresden (Germany)