ALD Lab Saxony Symposium at SEMICON 2017 announcement

The ALD Lab Saxony Symposium is a yearly side event of the SEMICON Europe organized since 2012. The Symposium is intended to improve visibility of the Atomic Layer Deposition technique and its capabilities and to increase the networking within the ALD community. The given talks show an overview of various research and development topics as well as examples of ALD applications in manufacturing. This year’s agenda combines talks from ALD Lab Saxony members and partners from academia and industry on ALD equipment, applications, metrology and simulations.


14th of November 2017 (10:00 am to 15:00 pm)


Hall A1, Conference room A12 @ Semicon 2017, Munich (Germany)


10:00 to 12:00 Session 1 – Equipment and Applications

10:00 “Welcome”, Prof. Bartha, TU Dresden (Germany)

10:20 “ALD for Production”, Dr. Christoph Hossbach, Picosun (Finland/Germany)

10:40 “Fabrication of 3D microstructures from micron-sized powder using ALD and possible applications for MEMS”, Dr. Thomas Lisec, Fraunhofer ISIT (Germany)

11:00 “ALD Coatings on Steel: Defect Density and Corrosion Protection”, Tim Poljanšek, Robert Bosch GmbH (German)

11:20 “Passivation, Capacitors or 3D-Structures” – Outline the Possibilities of ALD, Dr. Dorothee Dietz, Fraunhofer IMS (Germany)

11:40 “Antireflection Coatings by Atomic Layer Deposition”, Kristin Pfeiffer, Fraunhofer IOF (Germany)

12:00 to 13:00 Lunch and Networking
13:00 to 15:00 Session 2 – Precursors, Precursor Delivery, Metrology and Simulations

13:00 “ALD equipment and precursors for high volume manufacturing”, Dr. Jonas Sundqvist, Fraunhofer IKTS (Germany)

13:20 “Precursor supply chain support”, Dr. Simon Rushworth, EpiValence (UK)

13:40 „Electronics: a key market for Umicore – a key partner for the market”, Dr. Oliver Briel, Umicore (Germany)

14:00 “Precursor systems delivery for ALD”, Daniel Schlamm, SEMPA Systems GmbH (Germany)

14:20 “ALD process monitoring with quartz crystal microbalances”, Dr. Martin Knaut, TU Dresden (Germany)

14:40 “ALD process optimization using computational fluid dynamics”, Linda Jäckel, Fraunhofer ENAS (Germany)