Program Released – ALD for Industry, EFDS Workshop 17-18 January 2017, Dresden, Germany

Last week we released the program for the tutorials for the  ALD for Industry, EFDS Workshop 17-18 January 2017, Dresden, Germany. Now we are very proud to release the full program for the Workshop the following day!
In an European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users. Here, Dresden and Saxony is a unique ALD hotspot due to a strong semiconductor and equipment industry.

Please visit EFDS for all information for this event and how to register HERE!

As you can see we have managed to put together a fantastic program with representatives from the European ALD Equipment Industry : Picosun (FIN), Beneq (FIN), Sentech (GER), FHR Anlagenbau (GER), Encapsulix (FRA), ASM International (NL) and special guests from the USA  – Ultratech CNT!

In addition, representatives from the chemical industry (Air Liquide), customers (Robert Bosch) and research institutions from Germany (Fraunhofer) and Finland (Aalto University and VTT Finland) will make invited and contributing talks.

Topics will cover industrialization of ALD beyond the semiconductor industry:

▪ MEMS & Sensors ▪ Display ▪ Lightning ▪ Barriers ▪ Photovoltaics

Workshop program – Wednesday, January 18, 2017

09:00 Welcome to ALD for Industry
Dr. Sven Richter, Dr. Jonas Sundqvist, Dr. Christoph Hossbach EFDS & ALD Lab Saxony
09:20 ALD/MLD of flexible inoganic-organic hybrid thin films towards future energy harvesting and storage technologies
Prof. Maarit Karppinen; Department of Chemistry, School of Chemical Technology, Aalto University, Finland
10:00 ALD technology for the continuation of Moore’s law
Dr. Harald Profijt; Corporate R&D, ASM International, Netherlands
10:30 ALD for Life Science Applications
Dr. Ganesh Sundaram; Ultratech, Cambridge Nanotech, USA

10:50 Coffee Break

11:20 Solid precursors for ALD: challenges and opportunities
Dr. Nicolas Blasco; Air Liquide, France
11:40 ALD for optics
Dr. Adriana Szeghalmi; Friedrich-Schiller-Universität Jena, Institute of Applied Physics, Germany
12:00 Opportunities, challenges and solutions for ALD thin-film encapsulation in flexible electronics applications
Dr. Mikko Söderlund; Beneq Oy., Finland

12:20 Lunch Break

13:20 Industrial deployment of nano-engineered ultrabarriers for encapsulation of organic electronics
Dr. Jacques Kools; Encapsulix S.A., France
13:40 ALD applications in MEMS manufacturing
Dr. Florian Schön; Robert Bosch GmbH, Germany
14:00 ALD and 3D coatings
Dr. Tero Pilvi; Picosun Oy., Finland
14:20 Thin films in 3D structures: metrology with microscopic lateral high-aspect-ratio structures
Mikko Utriainen; VTT Technical Research Centre of Finland Ltd., Finland

14:40 Coffee Break

15:00 Where no man has gone before – unique equipment enables unique research
Dr. Hannes Klumbies; FHR Anlagenbau, Germany
15:20 ALD systems for no damage, high uniformity and stability of multilayer deposition
Dr. Hassan Gargouri; SENTECH Instruments GmbH, Germany
15:40 ALD process optimization by equipment simulation
Dr. Jörg Schuster; Fraunhofer ENAS, Germany
16:00 Closing remarks and discussion
Dr. Sven Richter, Dr. Jonas Sundqvist, Dr. Christoph Hossbach
EFDS & ALD Lab Saxony
16:20 End of Workshop Day