The 5th ALD Symposium at SEMICON Europa will be organized by ALD Lab Saxony, 25th of October in Grenoble France.
The intention of the symposium is to bring together researchers, process developers, tool makers, precursor suppliers and applicants of this exciting technology that can be summarized as Atomic Layer Processing.
Date: 25 October 2016
Time: 9:00–13:00
Location: Le Bans
Web : http://www.semiconeuropa.org/ald-lab
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9:00
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Welcome Address and Introduction of ALD Lab Saxony
Johann W. Bartha, TU Dresden, IHM
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9:20
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Growth of Ultrathin Cu Films Deposited by Atomic Layer Deposition for BEOL Application
Stefan E. Schulz, Fraunhofer ENAS
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9:40
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Development of Spatial ALD at the LMGP: Application to Transparent Conductive Materials
M. David Muñoz-Rojas, LMGP, Grenoble INP
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10:00
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How Fast Can We Go : Thermal ALD with Millisecond Purge Times
Jacques C. S. Kools, Encapsulix SAS
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10:20
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Atomic Layer Etching
Fred Roozeboom, TNO – Solliance, TU Eindhoven
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10:40
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Break
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11:20
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Visualization of Nucleation Mechanism During Atomic Layer Deposition with Scanning Probe Techniques
Marion Geidel, Johanna Reif, TU Dresden, IHM
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11:40
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Plasma ALD of Conductive Nitrides and Metals
Harm C. M. Knoops, Oxford Instruments
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12:00
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Novel liquid precursor sources for conformal Ln2O3 ALD and coatings
Nicolas Blasco, Air Liquide |
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12:20
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ALD for Optical Applications
Tero Pilvi, Picosun Oy
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12:40
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Closing Address
Johann W. Bartha, TU Dresden, IHM
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