Review of ALD Symposium at SEMICON Europa 2016

Welcome to a review of 5th ALD Symposium at SEMICON Europa. The event was organized by ALD Lab Saxony and headed by Johann W. Bartha, director of the Institute of Semiconductors and Microsystems at TU Dresden. Main topic of the symposium was Atomic Layer Deposition (ALD), but also  further Atomic Layer Processing technologies, like Molecular Layer Deposition (MLD) and Atomic Layer … Read More

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ALD Symposium at SEMICON Europa, 25 October 2016

The 5th ALD Symposium at SEMICON Europa will be organized by ALD Lab Saxony, 25th of October in Grenoble France. The intention of the symposium is to bring together researchers, process developers, tool makers, precursor suppliers and applicants of this exciting technology that can be summarized as Atomic Layer Processing. Date: 25 October 2016 Time: 9:00–13:00 Location: Le Bans Web … Read More

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ALD Lab Saxony presented Fast Precursor Screening at ALD 2016 Conference

IHM of TU Dresden and Fraunhofer have under the collaboration of “ALD Lab Saxony” for a number of years collaborated with Modularflow in using the Mini ALD Reactor for fast precursor screening. They presented results together in the Poster Session of ALD 2016 some weeks ago (see Poster below). The presented work was part of the Master Thesis research of … Read More